PLANERLITE
“PLANERLITE” has been developed as a high-purity, high dispersion, scratch-free CMP polishing material with superior processing efficiency.
It is an effective material designed for high-level surface processing on wafers containing multilayer circuits.
| Product name | Specifications |
|---|---|
| PLANERLITE 4000 Series | Slurries for oxide films |
| PLANERLITE 5000 Series | Slurries for W |
| PLANERLITE 6000 Series | CMP slurries for Poly-Si |
| PLANERLITE 6500 Series | Rinse slurries for particle removal on Poly-Si film |
| PLANERLITE 7000 Series | Slurries for Cu |
| PLANERLITE 8000 Series | Polishing slurries for Cu/Ta and other barrier films |
Other products
Fujimi handles slurry materials designed for a variety of purposes. Please feel free to ask for further information.
| Use | Product name and description |
|---|---|
| HKMG (High-k/Metal gate) High dielectric constant film/metal gate |
In addition to the leading edge device technologies on the left, we also develop slurry ideally suited to customer needs. Please contact us for further details. |
| FinFET 3D transitors |
|
| TSV (through-silicon via) | |
| Polishing slurry for resins | |
| New materials (for III-V materials, Co, SiC, and Si-Ge polishing) |
